Ferromagnetic materials, whose thickness is below 1 micron, are called the magnetic thin film materials.
They should be attached to the weak magnetic material when used and the
magnetic properties of them depend on the preparation methods and
process conditions.
There are three main kinds of preparation methods of Magnetic thin film material. The first one is Vacuum evaporation method. That is, under the vacuum condition, depositing magnetic materials with heated evaporation on a substrate. And the second one is electro deposition method. Soon making the magnetic material and the substrate an anode and a cathode, and then depositing the magnetic material working as the anode on a substrate as the cathode, through electrochemical reaction in the electrolyte. And then, the third one is the sputtering method. Using the magnetic materials as the cathode and the substrate as the anode, and then taking inert gas into the vacuum and making the ionization ion bombard the cathode in high speed, and after these processes, the surface of the cathode sputtered atoms will be attached to the anode substrate.
There are three main kinds of preparation methods of Magnetic thin film material. The first one is Vacuum evaporation method. That is, under the vacuum condition, depositing magnetic materials with heated evaporation on a substrate. And the second one is electro deposition method. Soon making the magnetic material and the substrate an anode and a cathode, and then depositing the magnetic material working as the anode on a substrate as the cathode, through electrochemical reaction in the electrolyte. And then, the third one is the sputtering method. Using the magnetic materials as the cathode and the substrate as the anode, and then taking inert gas into the vacuum and making the ionization ion bombard the cathode in high speed, and after these processes, the surface of the cathode sputtered atoms will be attached to the anode substrate.
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